Round Titanium Sputtering Target Forged CNC Machining

Customized Titanium Target Titanium Round Target

High-purity and high-density titanium sputtering targets include:
Titanium sputtering target (purity: 99.9%-99.999%)

Usually we will provide a quality inspection report like this with the goods,

which shows the chemical composition and physical properties

Q: Why choose us?

A1: We have 14 years experience for titanium products making.

A2: sample order is acceptable.

A3: lower price, good quality and short delivery time.

A4:The quotation can be make within 24 hours.

A5: ISO9001:2015 certification

A6: Give us drawing, make your drawings and ideas become a reality!

A7: Provide third-party quality inspection reports.

Processing various titanium targets for coating:

Metal targets: tungsten target, molybdenum target, tantalum target, niobium target, zirconium target, cobalt target, vanadium target, copper target, platinum target, hafnium target, niobium target, aluminum target, iron target, chromium target, titanium-niobium alloy target , titanium-zirconium alloy target, titanium-tungsten alloy target, titanium-gui alloy target, titanium-aluminum target, nickel-chromium alloy target, aluminum-chromium alloy target, high-purity titanium target, ultra-high-purity titanium target, high-purity nickel target, high-purity tantalum target, polysilicon Target material, ultra-high purity aluminum target, (99.95%-99.999%),

Classification: Multi-arc ion coating target, titanium flat target, titanium rotary tube target, titanium target back plate, titanium target back tube

Uses: tool coating, decorative coating, electronics industry, flat panel display industry, large area Low-E glass coating, semiconductor, LCD, solar energy industry, optical lens, optoelectronic industry, ceramic binding target, spraying target, etc.

Magnetron sputtering coating target:
Metal sputtering coating target, titanium sputtering target, alloy sputtering coating target, ceramic sputtering coating target, boride ceramic sputtering target, carbide ceramic sputtering target, fluoride ceramic sputtering target , nitride ceramic sputtering target, oxide ceramic target, selenide ceramic sputtering target, silicide ceramic sputtering target, sulfide ceramic sputtering target, telluride ceramic sputtering target, other ceramic target Material, chromium-doped silicon oxide ceramic target (Cr-SiO), indium phosphide target (InP), lead arsenide target (PbAs), indium arsenide target (InAs).