Titanium Gr1 Metal Sputtering Target Material CNC Lathe Surface

High Purity Metal Target Titanium Diboride/ TiB2 Target Materials
 
Square Pure Titanium Sputtering Target High Purity 99.995% Circular Ti Titanium Sputtering Target
Titanium sputtering target
 
target pure titanium target, MMO Coating Titanium Anode
 

 
High purity and high density sputtering targets include:
Sputtering target (purity: 99.9% - 99.999%)
Titanium target titanium sputtering target is used for liquid crystal display, laser memory, electronic controller sputtering thin film materials, semiconductor integrated circuits, solar photovoltaic, recording media, plane display and workpiece surface coating
Q: Why choose us?
A1: We have 14 years experience for titanium products making.
A2: sample order is acceptable.
A3: lower price, good quality and short delivery time.
A4:The quotation can be make within 24 hours.
A5: ISO9001:2015 certification
A6: Give us drawing, make your drawings and ideas become a reality!
A7: Provide third-party quality inspection reports.